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FEI EXPANDS HELIOS NANOLAB FAMILY FOR SEMICONDUCTOR MARKET.

AsiaPulse News

| December 01, 2006 | COPYRIGHT 2006 Asia Pulse Pty Ltd. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan.  All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)Copyright

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HILLSBORO, Oregon, Nov 30 /PRNewswire-AsiaNet/ -

NanoLab 400/400S to be Introduced at SEMICON Japan Giving Users a Complete Range of Advanced Solutions for Semiconductor Labs

FEI Company (Nasdaq: FEIC) will expand its top-of-the-line Helios NanoLab(TM) family of DualBeams(TM) when it introduces the Helios NanoLab 400 and 400S systems next week at SEMICON Japan. Combining advanced focused ion beam (FIB) and scanning electron microscope (SEM) technologies in a highly-integrated and easy-to-use platform, the Helios NanoLab family of tools will provide semiconductor manufacturers with a complete range of advanced high-resolution solutions for their analytical labs.

The Helios NanoLab family represents the next-generation of technology following the success of FEI's popular Strata(TM) 400 and 400 STEM (scanning/transmission electron microscope) in the semiconductor market. As with all FEI products for semiconductor manufacturers, the new Helios NanoLab systems are designed to help semiconductor companies move through their design and process ramps quickly and with more efficiency, enabling them to move new products to market faster.

The Helios NanoLab family features a new ultra-high resolution field emission SEM column combined with FEI's widely acclaimed Sidewinder(TM) FIB column and gas chemistries to provide up to 40 percent improvement in imaging resolution compared to previous DualBeam systems. These systems feature greatly enhanced low-kV SEM resolution to support cross-sectional imaging and analysis and advanced STEM applications for devices featuring new materials and sub-65 nm design nodes. They also provide enhanced stability and optimized operation within a wide range of parameters.

The Helios NanoLab 400 offers an advanced high resolution stage and load lock and the 400S is equipped with a flip stage for highly precise sample localization to bridge the SEM-TEM gap. The 600 system, introduced earlier this year, offers a larger stage for versatile sample handling.

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Source: HighBeam Research, FEI EXPANDS HELIOS NANOLAB FAMILY FOR SEMICONDUCTOR MARKET.

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