PROCESSING: Large Order for CVD Systems.(Brief Article)

Mattson Technology Inc. (2800 Bayview Dr., Fremont, CA 94538; Tel: 800/MATTTSON, Fax: 510/657-0165; Website: mattson.com), a leading supplier of advanced process equipment used to manufacture semiconductors, said it had received an order exceeding $9 million from a major DRAM manufacturer for multiple Aspen III CVD systems, plasma enhanced chemical vapor deposition equipment.

Built on Mattson's unique Aspen III platform, the system offers the industry's highest throughput for thin-film applications. The high throughput, combined with Mattson's three-year warranty, provides a cost of ownership advantage over competitive CVD systems. Since its market introduction in the first quarter of 1999, the Aspen III CVD system has quickly gained market acceptance with the receipt of multiple orders in 1999. The systems are scheduled to be shipped in the second quarter, 2000.

Advanced CVD processing systems are of vital importance in the area of silicon micromachining and the fabrication of MEMS devices. Much of the work done in these advanced areas is similar to semiconductor processing.

The 200-mm/300-mm bridge tool can use the same chamber to process either 200-mm or 300-mm wafers. Mattson technology continues to work closely with key customers in Japan, North America, and Europe to ease the transition from 200-mm to 300-mm wafer processing. The company has more than 20 Aspen III tools installed at leading edge semiconductor facilities around the world, running both 200-mm and 300-mm processes in production.

"We are continuing ...