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Real-Time Thin-Film Thickness Monitors.(Brief Article)

Microtechnology News

| February 01, 2000 | COPYRIGHT 2000 BCC Research. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan.  All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)Copyright

Ion Optics (411 Waverly Oaks Rd., Waltham, MA 02452; Tel: 781/788-8777) has won a Phase II Small Business Technology Transfer Program (STTR) award from the National Science Foundation (NSF) to develop a simple in situ film thickness monitor which can replace quartz crystal oscillators and other, more complex, instruments. This process is done in collaboration with Ted Morse, professor at the Boston University Photonics Center and Lasertron, (a division of Oak Industries, soon to be part of Corning Inc.), a leading manufacturer of near- infrared (NIR) lasers for fiber-optic communications.

Thin-film deposition is an important step in the fabrication of every advanced optoelectronics or photonic device. Improved understanding of the film's structure, surface roughness, refractive index, defect density, and composition directly leads to lower costs, improved quality, and faster production rates. In fact, prototype testing in Lasertrons's electron beam evaporation process showed that real-time monitoring would improve the yields and double production throughput of their near infrared (NIR) laser diodes. Further improvements to the thin-film monitor ...

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