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New Systems for Thin Films.
Rudolph Technologies (One Rudolph Rd., Flanders, NJ 07836; Tel: 973/691-1300) introduced its new S200 systems for diffusion and thin-film deposition with MatrixMetrology, which provides an application-optimized set of metrology techniques. Both tools combine ultra-small spot ellipsometry, microspot visible reflectometry, and integrated applications software customized for diffusion or thin-film deposition. They deliver a combination of robust pattern recognition, measurement speed, and thin-film measurement capabilities needed for these applications, while at the same time providing a cost-effective solution for each process.
The MatrixMetrology approach enables its customers to pick an assembly of advanced metrologies needed to meet the requirements for that particular process and leave off the technologies not needed. For example, the tool for diffusion must have good thin-film performance with an HeNe laser ellipsometer, a DUV reflectometer, and the high repeatability required for such ultrathin films. The S200 Diffusion system has one of the smallest (5-micron 10-micron) ellipsometer spots with its 633-nm, 780-nm, and 458-nm HeNe laser ellipsometer for on-product measurement and a microspot (2.5-micron) visible reflectometer (470-905 nm) for high throughput (120-wph) film thickness measurement. In addition, it has a DUV (190-nm to 470-nm) reflectometer and high repeatability mode (HRM) with mili-Angstrom repeatability. The HRM option provides a repeatability of [LESS THAN]0.006 angstroms on 30-angstrom Si02 over 12 hr.
The S200 Thin Film ...
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