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Manufacturable source mask optimization.

Microlithography World

| November 01, 2008 | Himel, Marc D.; Carriere, James T.A.; Schellenberg, F.M.; Granik, Y. | COPYRIGHT 2008 PennWell Publishing Corp. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan.  All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)Copyright

Diffractive optical elements improve imaging by optimizing the illumination for critical mask patterns without excessive loss of light.

Among the innovations in lithography that enable pursuit of Moore's Law into the sub-wavelength realm is off-axis illumination (OAI), which shapes illuminator optics so that light falling on the photomask has certain angles emphasized at the expense of others (with light at normal incidence, "on-axis" significantly reduced or absent). This is typically represented by a diagram (Fig 1.) in the pupil plane of the optical system, where the x-y position corresponds to a certain angle of incidence, with the center representing normal ...

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