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Laser Produced Plasma (LPP) EUV source technology has advanced towards the specifications needed for actual chip production.
The clear leader for high-power production EUV sources is laser-produced plasma (LPP) technology. After investigating alternatives, UP has been Cymer's chosen technology path for the last four years. This source architecture provides key advantages of both high conversion and collection efficiency with intrinsic scalability of output power.
Source power and lifetime have been top issues for EUVL development in lithography industry surveys for the past three years. This is because the high throughput needed to provide competitive ...