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Development of a production EUV source.

Microlithography World

| November 01, 2008 | Farrar, Nigel R.; Brandt, David C. | COPYRIGHT 2008 PennWell Publishing Corp. This material is published under license from the publisher through the Gale Group, Farmington Hills, Michigan.  All inquiries regarding rights should be directed to the Gale Group. (Hide copyright information)Copyright

Laser Produced Plasma (LPP) EUV source technology has advanced towards the specifications needed for actual chip production.

The clear leader for high-power production EUV sources is laser-produced plasma (LPP) technology. After investigating alternatives, UP has been Cymer's chosen technology path for the last four years. This source architecture provides key advantages of both high conversion and collection efficiency with intrinsic scalability of output power.

Source power and lifetime have been top issues for EUVL development in lithography industry surveys for the past three years. This is because the high throughput needed to provide competitive ...

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