Microlithography World articles from November 2007

Microlithography World archives from November 2007

Lithography for mobile displays.
November 1, 2007... Flat panel displays (FPDs) vary in dimension from less than one inch to many feet across and are made using photolithography technology specialized for the substrates and economics of each application. Displays for mobile devices--such as...

Double exposure inverse lithography.
November 1, 2007... The two masks required for double exposure techniques (such as chromeless phase-edge lithography) can be designed using inverse lithography methods. When integrated circuit layouts are transferred onto silicon wafers by means of optical...

Optical behavior of pellicles.(The Lithography Expert)
November 1, 2007... Pellicles have been used to protect photomasks from particles since the late 1970s [1]. A thin, transparent polymer film stretched over a rigid frame is glued to the business side of a photomask to keep particle contaminants from landing on the...

The ultimate solution for 193nm reticle haze?
November 1, 2007... Pervasive environmental control retards the growth of haze and progressive defects on photomasks that otherwise limit the reticle lifetime, even though haze precursors may remain on the mask surface. Photomask manufacturers expend great...

Mask industry survey: steady as she goes, no icebergs ahead.(NEWS & PRODUCTS)
November 1, 2007... The photomask industry is puttering along as usual, according to the 2007 annual industry self-assessment survey presented by Gil Sheldon at the SPIE Symposium on Photomask Technology (Sept. 18). Revenues maintained their recent 1.2% of the...

IMEC tips early EUV results, readies for preproduction tool.(NEWS & PRODUCTS)
November 1, 2007... IMEC says it has produced the first high-resolution images in alpha-demo work on extreme ultraviolet (EUV) lithography--horizontal and vertical 35nm and 40nm lines and spaces in 100nm MET-2D resist (from Rohm & Haas) at 18mJ/[cm.sup.2], exposed...

Firms promote "end-to-end etch process" for NIL.(NEWS & PRODUCTS)(NIL Technology and Oxford Instruments )(Brief article)
November 1, 2007... NIL Technology and Oxford Instruments say they have developed a common etch process that covers all etch steps in nano-imprint lithography production. The system, using Oxford's Plasmalab System 100 inductively coupled plasma tool, spans...

Micronic debuts Prexision pattern generators.(NEWS & PRODUCTS)
November 1, 2007... Micronic Laser Systems AB has unveiled two new pattern generators for display applications: the Prexision-8 for production of high quality photomasks through Generation-8 LCD panels, and the Prexision-10 targeting production of photomasks for...

Toppan joins CEA-Leti's double patterning program.(NEWS & PRODUCTS)(Toppan Photomasks Inc.)(Brief article)
November 1, 2007... Toppan Photomasks Inc. has joined a consortium led by European research lab CEA-Leti to jointly develop double patterning techniques, seen as a way to extend 193nm lithography to the 32nm and an eventual bridge to EUV. Combining Toppan's...

Synopsys, Nikon: Software + scanner data = "manufacturing-aware" DFM.(NEWS & PRODUCTS)
November 1, 2007... Nikon Corp. and Synopsys Inc. have delivered what they say is a "manufacturing-aware" system for 45nm and below chipmaking by combining info gleaned from Nikon scanners with Synopsys' Proteus soft ware, to develop sub- 45nm litho models. ...

Firm touts "breakthrough" for 32nm maskless litho.(NEWS & PRODUCTS)(Mapper Lithography)(Brief article)
November 1, 2007... Dutch firm Mapper Lithography says it has achieved "massively parallel electron beam writing" with its newest maskless litho technology, demonstrating 45nm dense patterns in resist. The company's new maskless litho technology, which it says...

Shows & Conferences.(Brief article)(Calendar)
November 1, 2007... SEMICON Japan 2007 December 5-7 * Chiba, Japan SEMI's exhibition of semiconductor equipment and materials will showcase tools and technologies, including mask and reticle manufacturing equipment, exposure, direct-write equipment,...

Patent reform--again.(EDITORIAL)
November 1, 2007... The US patent system has been a quagmire of dysfunction for over a century. Now the Congress is trying to reform it again and may make it worse. The problem is that there really are irreconcilable interests in the intellectual property (IP)...