Microlithography World articles from November 2005

Microlithography World archives from November 2005

Defectivity in water immersion lithography.(FEATURE)
November 1, 2005... The origin, nature, and impact of defects intrinsic to water immersion lithography are identified, along with mitigation strategies for controlling them. ********** Accumulating experimental evidence suggests some defects are...

Shape goes critical for sub-100nm process control.(FEATURE)
November 1, 2005... Feature shape control has become vital to yield. For features with high aspect ratios, 1D critical dimension (CD) measurements are inadequate. A new-generation CD scanning electron microscopy (CD-SEM) system uses critical shape metrology (CSM)...

The lithography expert: horizontal-vertical bias.(FEATURE)
November 1, 2005... A nanometer here, a nanometer there. Before long, you've got a serious linewidth error. That's the way many lithographers feel about assessing the sources of critical dimension (CD) errors affecting sub-100nm processes. While just a few years...

Fast RET verification in a box?(FEATURE)
November 1, 2005... Ever-decreasing lithography [k.sub.1] values demand tighter design-to-manufacturing integration. To verify imaging performance, Photronics is exploring an application-specific lithography computer, which achieves high accuracy, superior...

EVG sells hot embosser to NIL contractor.(NEWS & PRODUCTS)
November 1, 2005... EV Group, a supplier of nanoimprint lithography (NIL) equipment, has announced the sale of an EVG570 high-volume hot embossing system to NIL Fab Inc., a NIL contract manufacturer offering prototyping of Roadmap-compliant, low-cost analytical...

Linewidth standards.(NEWS & PRODUCTS)
November 1, 2005... VLSI Standards Inc. offers a suite of linewidth standards, called NanoCD Standards, for sub-100nm accuracy and magnification calibration. The NIST-traceable, TEM-certified standards are available in 70, 45, and 25nm linewidths for calibration...

Cymer to deploy e-diagnostics software.(NEWS & PRODUCTS)
November 1, 2005... Cymer Inc. plans to deploy CymerOnLine, a suite of lithography light source-specific e-diagnostics and performance-monitoring software, to 48 new fabs worldwide in 2H05. The software is designed to support Cymer's installed base of lithography...

Laser pattern generator for both binary and PSMs.(NEWS & PRODUCTS)
November 1, 2005... Micronic Laser Systems AB has introduced its Sigma7500 system laser pattern generator, which is applicable at the 90, 65, and 45nm nodes for both binary and phase-shift masks (PSM). A 248nm KrF excimer laser combines with spatial light...

Shows & conferences.(Brief Article)
November 1, 2005... Semicon Japan December 7-9 * Tokyo, Japan SEMI's exhibition of semiconductor equipment and materials expects to house more than 4200 booths and 1600 exhibitors from all over the world. For more information, contact: SEMI, ph...

Needed: an admiral of the 'nano sea'?(EDITORIAL)
November 1, 2005... To accelerate the exploitation of structures with dimensions At a nanotechnology conference last summer, ethicist George Khushf of the U. of South Carolina pointed something out: If the nano realm really is so different, we cannot...