Microlithography World articles from November 2004

Microlithography World archives from November 2004

The TAO of lens adjustment: realizing pattern-specific optimization.(FEATURE)
November 1, 2004... Modern lithography projection lenses enable adjustment of several parameters that affect aberrations. Phase-measuring interferometers, imaging-simulation software, and accurate models of these adjustments' effects allow lenses to be optimized...

The lithography expert: depth-of-focus and the alternating phase-shift mask.(FEATURE)
November 1, 2004... One of the biggest advantages of using a strong phase-shifting mask (PSM), such as the alternating PSM, is the increased depth-of-focus (DOF) of fine-pitch patterns (see "The Lithography Expert," May 2003). Here we will numerically evaluate the...

Monitoring lithography product data for real-time focus control.(Feature)
November 1, 2004... The difference between the width of the bottom of an isolated resist line and the width of the top can be extracted from CD-SEM data and used as a focus monitor metric. This facilitates real-time on-product focus control and the prompt...

Simulation advances and new alliance for Sigma-C.(NEWS & PRODUCTS)(Photronics' Integrated Lithography Plane program)(Brief Article)
November 1, 2004... Sigma-C GmbH, a provider of fabrication simulation software, and Photronics Inc., a photomask supplier, have agreed to combine technologies to bolster Photronics' Integrated Lithography Plane (ILP) program, which supports design and mask...

IMEC collaborations multiply.(NEWS & PRODUCTS)(Brief Article)
November 1, 2004... In the span of a few months since the Belgium-based nanoelectronics and nanotechnology research center IMEC kicked off its 193nm immersion-lithography program, it has enlisted more than 30 IC manufacturers, tool suppliers, resist/BARC...

UCF gift gives EUV a push.(University of Central Florida, extreme ultraviolet)(Brief Article)
November 1, 2004... The University of Central Florida has received a $24 million donation from Northrop Grumman's Space Technology Division to further the College of Optics and Photonics' research into shorter-wavelength light sources for extreme ultraviolet (EUV)...

SEMICON Japan.(SHOWS & CONFERENCES)(Brief Article)
November 1, 2004... December 1-3 * Tokyo, Japan The event will also include SEMI's Technical Symposium, focusing on semiconductor and device manufacturing technologies. For more information, contact: SEMI Japan, ph 81/3-3222-6022, e-mail...

3rd Intl. Conf. on NNT.(international conference, Nanoimprint and Nanoprint Technology)(Brief Article)
November 1, 2004... December 1-3 * Vienna, Austria Topics at the conference on Nanoimprint and Nanoprint Technology will include soft and dip-pen lithography and far-reaching applications such as materials, self-assembly, pharmaceuticals, and optoelectronics....

21st EMLC.(European Mask and Lithography Conference)(Brief Article)
November 1, 2004... January 31-February 3 Dresden, Germany The European Mask and Lithography Conference focuses on the science, technology, engineering and application of mask technology and associated processes. For more information, contact: Uwe...

Microlithography 2005.(SHOWS & CONFERENCES)(Brief Article)
November 1, 2004... February 26-March 4 San Jose, CA SPIE's 30th International Symposium on Microlithography will include an exhibition, conferences, and courses. Previous courses have covered particle and defect detection, nanoscale patterning, and many...

Magnification bifurcation.(methods)(Editorial)
November 1, 2004... In this issue, we have two articles on the endlessly contentious topic of magnification in projection lithography. Dr. Scott Hector and Prof. Kiwamu Takehisa disagree on whether the liquid immersion tools intended for the 45nm node should have...