Microlithography World articles from May 2008

Microlithography World archives from May 2008

Thermal aberration control.
May 1, 2008... Leading-edge exposure tools must provide a means to control and compensate for projection lens thermal aberrations that result from today's high powered laser sources and advanced off-axis illumination techniques. Each new generation of...

Solving the gate ACLV and ADLV challenges with printing assist features.
May 1, 2008... Double patterning can shrink tip-to-tip spacings and improve across-chip and across-device linewidth variation (ACLV and ADLV) versus single exposure processes. A decomposition approach for gate levels using line-end extensions and printing...

Mask specifications: it's not getting any easier.(The Lithography Expert)
May 1, 2008... Moore's Law, as practiced today by the semiconductor industry, is all about scaling. Feature sizes, overlay errors, operating voltages, drive currents--everything must scale in some fashion to enable the next generation of device technology. In...

Innovative refractive optics for exposure tool illumination.
May 1, 2008... Arrays of refractive micro-optics are ideal homogenizing elements in illumination systems for exposure and metrology tools. Such arrays can provide profiles with uniformity significantly better than 1% peak-to-valley at numerical apertures...

OPC for contacts.(optical proximity correction )
May 1, 2008... When you are using optical proximity correction (OPC) to optimize contacts and vias, the obvious solution is not always the correct solution. Optical proximity correction is now well-established in the industry to allow for manufacturing...

Graphs and ethics in science.(Editorial)
May 1, 2008... I don't know if things have gotten worse, or if I have just become less tolerant. In either case, I have seen far too many examples lately of a serious problem in lithography presentations and publications: the graph with no axis labels. ...