Microlithography World articles from May 2007

Microlithography World archives from May 2007

Self-assembled resists for nanolithography: block copolymers can be made to phase-separate, creating nanoscale structures useful for device manufacturing, and the positions of the nanostructures can be controlled by larger-scale physical and chemical templates patterned on the substrate.
May 1, 2007... The rapid reduction in the feature sizes of microelectronic and data-storage devices has created a great deal of interest in finding effective ways to pattern materials on the nanoscale. Self-assembly is a promising way to produce nanoscale...

SEM contour-based OPC model calibration: calibrating OPC models using feature contours extracted from SEM images gives more reliable results than using CDs at specific sites.(optical proximity correction)(critical dimension)(scanning electron microscope)
May 1, 2007... The accuracy with which optical proximity correction (OPC) models predict dimensions and yield in lithography is becoming more and more critical as critical dimension (CD) requirements tighten. Up to this point, OPC calibration has been based...

Line-edge roughness, Part 2.(THE LITHOGRAPHY EXPERT)(Column)
May 1, 2007... In the last edition of this column [1], I began the difficult process of trying to understand the fundamental mechanisms behind the formation of line edge roughness (LER). The approach I've taken is called stochastic modeling, and involves the...

Advanced photomask repair and verification.(Cover story)
May 1, 2007... A new method for advanced photomask repair employs e-beam activated chemistry to repair clear, opaque, and phase-bump defects and then validates the repairs with an optical tool that emulates immersion stepper imaging. A case study carried out...

Shows & conferences.(semiconductor industry)(Brief article)(Calendar)
May 1, 2007... EIPBN 2007 May 29-June 1 * Denver, CO Session topics for the 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN) may include DUV, immersion, EUV, x-ray, and e-beam and ion-beam lithography,...

Positive publishing.(EDITORIAL)
May 1, 2007... At Microlithography World, we endeavor to present an optimistic view of our technology realm. Even when serious challenges remain at the time an article appears, we encourage authors to speculate about potential solutions, rather than conclude...