Microlithography World articles from May 2005

Microlithography World archives from May 2005

First microprocessors printed with immersion lithography.(FEATURE)
May 1, 2005... Immersion lithography has emerged as the leading solution for semiconductor manufacturing for the 45nm node, in spite of a continuing concern about defects. Fully functional 90nm PowerPC microprocessors have now been fabricated using immersion...

Knowledge-based automatic defect classification.(FEATURE)
May 1, 2005... A knowledge-based system for automatic defect classification can make subtle distinctions among macrodefect types, learn new types, and monitor their frequency while maintaining sufficient throughput to permit complete inspection of every wafer...

The lithography expert: bottom antireflection coatings for high numerical aperture imaging.(FEATURE)
May 1, 2005... As we saw in the last edition of this column, bottom antireflective coatings (BARCs) are used extensively to reduce substrate reflectivity, helping to eliminate both standing waves and swing curves. Unfortunately, even a well-designed...

AAPSM space-imbalance reduction for 65nm lithography.(FEATURE)
May 1, 2005... Rigorous vector simulations show how to minimize the intensity imbalance of spaces with opposite phases for 65nm-node alternating-aperture phase-shifting masks. Strategies such as undercut, bias, and a combination of undercut, bias, and a...

Getting small at SPIE Microlithography.(EDITORIAL)(Editorial)
May 1, 2005... Every year, experts troop to Silicon Valley for the SPIE International Symposium on Microlithography. It is an opportunity to learn from one's peers just what has been going on in fabs and labs around the world. Every year, it seems Moore's Law...