Microlithography World articles from May 2003

Microlithography World archives from May 2003

Immersion lithography: beyond the 65nm node with optics. (Feature).
May 1, 2003... An old method used to enhance optical microscopy has recently become a serious candidate to extend optical lithography to 65nm, probably to 45nm, and possibly even beyond. If liquid immersion lithography can be properly engineered, it will...

The real cost of RETs. (Feature).
May 1, 2003... Resolution enhancement technologies (RETs) have a cost in terms of data file size, computation times, complexity of metrology and inspection, licenses fees, manpower, and delay. The International SEMATECH cost of ownership (CoO) analysis (1)...

The lithography expert: resolution enhancement technologies. (Feature).
May 1, 2003... Classically speaking, optical lithography should have died long ago. The classical resolution and depth of focus (DOF) limits of conventional optical imaging would never allow the kind of performance that has become routine in advanced...

Patent system running amok. (Editorial).
May 1, 2003... Selling DUV exposure tools to the depressed semiconductor industry has been very tough for the last two years. At SPIE, the market projection was for only about 400 sales in 2003. When the going gets tough, some people go to court seeking...

Shows & Conferences/SPIE.
May 1, 2003... EIPBN '03 May 27-30 * Tampa, FL The 47th Annual Electron, Ion, and Photon Beam Technology & Nanofabrication show will address lithographic science and its application to micro- and nanofabrication. For more information, contact:...