Microlithography World articles from May 2002

Microlithography World archives from May 2002

Sub-50nm gate patterning using line-trimming with 248 or 193nm litho. (Future).
May 1, 2002... Line-trimming techniques enable lithographers to reduce gate dimensions by a controlled process, using well-established exposure tools and resists. Trimming might be a way to improve device speed and functionality and to explore structures for...

Photomask pattern generation strategies. (Cover Article).(Cover Story)
May 1, 2002... Treating image delivery as an integrated process can drive the optimum choice between a laser or electron beam pattern generator based on the mask application. Photomask producers are beginning to work more closely with users to create a...

Electrical CD metrology: An old idea whose time may have come again. (Feature).
May 1, 2002... Would you believe that there is a metrology method that was introduced into semiconductor manufacturing about the same time that I was born 35 years ago (1) has remained essentially unchanged since then, and is capable of providing competitive...

Using the normalized image log-slope Part 6: development path. (The Lithography Expert).
May 1, 2002... This is the final column in the series focused on the use of the normalized image log-slope (NILS) as a metric of image quality. The NILS is a measure of the information content of the aerial image and represents an energy (intensity) gradient...

Nikon tools used for 90nm technology chips. (News & Products).(Brief Article)
May 1, 2002... Nikon Precision Inc.'s NSR-305B ArF and NSR-204B KrF scanners and its NSR-SF100 i-line stepper were recently used by a leading chipmaker to produce functional ICs employing 90nm technology. The combination of the high resolution capability of...

Cymer receives funding for EUV research. (News & Products).(extreme ultraviolet)(Brief Article)
May 1, 2002... Cymer Inc., the San Diego-based supplier of excimer laser light sources, has received funding from a major US chipmaker for Cymer's extreme ultraviolet (EUV) light source R&D efforts. Since 1997, Cymer has been working on dense plasma focus EUV...

ASML introduces MEMS stepper. (News & Products).(ASML Special Applications MEMS 5201)(Brief Article)
May 1, 2002... ASML Special Applications has introduced a new family of 5x i-line reduction steppers targeted for MEMS and other applications, such as compound semiconductors and ASICs. The MEMS 5201 options package is a family of selectable capabilities for...

Feeding an appetite for thinner gates. (Editorial).(Editorial)
May 1, 2002... Perhaps the next ITRS Roadmap should consider attempting to discipline unenlightened desires and plan for plausible progress with more widespread economic rewards! The 2001 revision of the ITRS Roadmap shows that lithographers and...