Microlithography World articles from February 2005

Microlithography World archives from February 2005

Microlithography process development with lithography simulation.(COVER FEATURE)
February 1, 2005... Microlithography simulation is now a compulsory engineering tool, coping with the gap between exposure wavelength and the resolution required by Moore's Law. Rigorous simulation has been a key factor in the development and verification of...

The lithography expert: designing a bottom antireflection coating.(Column)
February 1, 2005... As we've seen before in this column (Summer 1997), antireflective coatings (ARC) are used extensively to reduce substrate reflectivity, helping to eliminate both standing waves and swing curves. Recapping the basic thin-film reflectivity...

DuPont Photomasks to close facility.(Brief Article)
February 1, 2005... DuPont Photomasks Inc. announced that as part of a consolidation plan designed to reduce costs and improve capital productivity, operations at its trailing-edge photomask production facility in Kokomo, IN, would begin to ramp down in January....

Lambda Physik ceases litho product development.(Brief Article)
February 1, 2005... Coherent Inc. has announced that its Lambda Physik subsidiary will discontinue future product development and investments in the semiconductor lithography sector due to market conditions. Lambda will continue to support its installed...

Nanoimprint litho going global.(Brief Article)
February 1, 2005... EV Group (EVG), Scharding, Austria, has announced the launch of a global consortium focused on commercializing nanoimprint lithography (NIL) technologies. NILCom's goal is to establish a high-volume manufacturing NIL platform in...

Overlay tool extends to 65nm and beyond.(Brief Article)
February 1, 2005... Accent Optical Technologies, a supplier of lattice engineering and photolithography process-control tools, has extended the 90nm Caliper platform to 65nm and beyond with the Caliper elan 300mm overlay tool. The tool reportedly delivers...

JSR demonstrates 32nm l/s with new immersion liquid.(Brief Article)
February 1, 2005... JSR Corp. has announced that it has successfully demonstrated 32nm line/space patterns using an argon fluoride (ArF) immersion lithography system and a high refractive-index solution, which the company believes will extend ArF lithography over...

Molecular contamination monitoring for 193nm litho.(Brief Article)
February 1, 2005... Extraction Systems has introduced a complete toolset for detecting and measuring ultralow levels of molecular contamination in lithography processes. Both the TMB-193 and the LithoScout address the need for continuous monitoring of the 193nm...

Applied, ASML swim in immersion pool together.(Brief Article)
February 1, 2005... Applied Materials Inc. and ASML have decided to collaborate on development of 65nm and below process technology for the semiconductor industry, according to company statements. Under the agreement, ASML will deliver its Twinscan XT:1250i...

Shows & conferences.(Calendar)
February 1, 2005... Photomask Japan 2005 April 13-15 * Kanagawa, Japan Topics at the 12th International Symposium on photomasks and NGL mask technology will range from processes and materials to cost and development strategies. For more information,...

Can we afford ourselves?(division of functions)(Editorial)
February 1, 2005... Americans have been among the most productive and hardest working people as long as statistics have been kept, but jobs have been going to lower-cost locations at least since the Hudson's Bay Company started trading in Canadian beaver pelts....