Microlithography World articles from February 2004

Microlithography World archives from February 2004

The lithography expert: the Rayleigh depth of focus.(Feature)(Column)
February 1, 2004... John William Strutt, the third Baron Rayleigh of Terling Place, was one of the most celebrated physicists of his day [1]. This prolific scientist contributed to almost every subject in classical physics; he discovered argon, winning him the...

Photolithography microsteppers: an EUV microstepper with 35nm resolution and 0.6 X 0.2mm field will speed experimentation on EUV resists and technologies, extending the record of these tools for early lithography learning.(Feature)(extreme ultraviolet lithography )(Cover Story)
February 1, 2004... The semiconductor industry uses microsteppers to gain early learning at new technology nodes four to five years ahead of their introduction. These tools use a reduced image field at an optical resolution similar to that intended to be adopted...

Practical DUV lithography for the optoelectronics market.(Feature)
February 1, 2004... Integrated optoelectronics devices typically have die sizes larger than the exposure fields of steppers and scanners optimized for semiconductor manufacturing, but resolution requirements greater than can be achieved through contact printing....

Order placed for industry's first immersion lithography system.(News & Products)(Brief Article)
February 1, 2004... ASML Holdings N.V. introduced the industry's first immersion lithography system, the TWINSCAN XT:1250i. ASML also announced that long-term partner TSMC has placed an order, with delivery scheduled for third quarter this year. The TWINSCAN...

Nikon immersion work sees better depth of focus.(News & Products)(Brief Article)
February 1, 2004... Nikon says practical depth of focus is 50%-100% improved in first experiments with adding immersion to its 193nm NSR-S307E scanner, though resolution naturally remains the same 80nm with the same 0.85NA lens, according to PennWell partner...

Groovy tool for 65nm low-k etching.(News & Products)
February 1, 2004... The revival of Japan's semiconductor industry looks likely to give a boost to its equipment suppliers as well--and not just the familiar big names. One of the handful of top new products from SEMICON Japan highlighted by PennWell partner Nikkei...

DCE enters lithography market.(News & Products)(Brief Article)
February 1, 2004... Dow Corning Electronics announced its entry into the lithographic materials market in January. The first available products in the lithographic platform are silicon-based resins designed for developing 193nm bilayer photoresists and...

TEL, Clariant launch pattern-collapse suppression process.(News & Products)(Brief Article)
February 1, 2004... Tokyo Electron Ltd. (TEL) and Clariant have jointly developed a process for surfactant rinse solutions and ultrafine patterns used in next-generation semiconductor production and will being selling it this year. The surfactant rinse solution...

Improved litho APC software.(News & Products)(Brief Article)
February 1, 2004... INFICON's NVS ARGUS 2.5.0 authomated process-control (APC) software addresses foundry and mixed-stream needs with intelligent reticle learning (IRL) and CD normalization (CD Norm). By learning and independently tracking the error contributions...

Large-area photolithography stepper.(News & Products)(Azores Corp)(Brief Article)
February 1, 2004... Azores Corp.'s Model 5200 PanelPrinter system provides advanced photolithography for large-area substrate applications requiring 0.8-4[micro]m resolution. These fully integrated subsystems incorporate a high-fidelity projection lens and...

Semicon China 2004.(Shows & Conferences)
February 1, 2004... March 17-19 * Shanghai, China SEMICON China will be held at the Shanghai New International Expo Center. This year, companies from Ablestik to ZMC Technologies Pte Ltd. will be attending the exhibition. See SEMI's Web site at www.semi.org...

Photomask Japan 2004.(Shows & Conferences)
February 1, 2004... April 14-16 * Kanagawa, Japan Photomask Japan 2004 is the 11th International Symposium on photomasks and NGL masks. This symposium brings together engineers and investigators to discuss recent progress, applications, and future trends in...

Semicon Europa 2004.(Shows & Conferences)
February 1, 2004... April 19-23 * Munich, Germany SEMICON Europa is a European conference and exhibition forum designed to address the challenges of the semiconductor industry. Proposed topics for presentation at the conference include factory automation,...

ARC Symposium--Europe.(Shows & Conferences)
February 1, 2004... April 27 * Leuven, Belgium The ARC Symposium is presented by Brewer Science. Speakers will generally present on the challenges of immersion lithography, 90nm technology challenges, and implant lithography. For more information,...

LPM 2004.(Shows & Conferences)
February 1, 2004... May 11-14 * Nara, Japan The 5th International Symposium on Laser Precision Microfabrication provides a forum for research and technology development in laser microfabrication/nanofabrication. Symposium proceedings will be published by SPIE...

EIPBN 2004.(Shows & Conferences)
February 1, 2004... June 1-4 * San Diego, CA The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication is dedicated to lithographic science and process technology, and its application to microfabrication and...

Call for papers: 3rd Intl. EUVL Symposium.(Shows & Conferences)
February 1, 2004... Deadline July 1 * Miyazaki, Japan The International Symposium on Extreme Ultraviolet Lithography will be held from November 2-4, 2004, organized by EUVA and ASET in cooperation with International SEMATECH and EUV CSC. Presentations are...

Semicon West.(Shows & Conferences)
February 1, 2004... July 12-16 * San Francisco and San Jose, CA This year at SEMICON West, the SIA brings together suppliers and manufacturers in a new series of ITRS meetings to report on the latest Roadmap developments and updates, with ITRS chairman Paolo...

Not forgotten!(Editorial)(Editorial)
February 1, 2004... This issue of Microlithography World features a semiconductor lithography timeline extending from the first proposal of Moore's Law in 1965 until the present, compiled by Dr. Franklin Schellenberg. Sorting through the history of our field...