Microlithography World articles from February 2003

Microlithography World archives from February 2003

Femtosecond laser mask repair. (Feature).
February 1, 2003... Opaque defects in photomasks are being repaired using an innovative automated femtosecond laser ablation tool at IBM. The tool images the mask in the DUV with 100nm resolution and ablates defects nonthermally with ~80nm resolution. An iterative...

Normal-incidence spectroscopic ellipsometry for optical CD metrology. (Feature).(optical critical dimension)
February 1, 2003... Normal-incidence polarized reflectance spectra of line-space patterns provide the same type of CD information as more complex scatterometry, ellipsometry, and reflectometry methods. Over the past year, optical critical dimension (OCD)...

The Lithography expert: the impact of phase errors on phase shifting masks, part 2. (Feature).(Industry Overview)
February 1, 2003... In the last edition of this column we examined the impact of phase errors on the printing of a phase edge, adjacent clear (transmitting) regions with nominally a 180[degrees] phase difference. Now let's look at the same effects for an...

ASMC '03. (Shows & Conferences / Spie).(Brief Article)(Calendar)
February 1, 2003... March 31-April 1 * Munich, Germany This conference outlines solutions to improve the industry's manufacturing processes, and includes such topics as "Investigation of reticle defect formation at DUV lithography" and "Photolithography...

Photomask Japan '03. (Shows & Conferences / Spie).(Brief Article)(Calendar)
February 1, 2003... April 16-18 * Yokohama, Kanagawa, Japan This 10th International Symposium on Photomasks and Next-Generation Lithography Masks will concentrate on progress, applications, and trends in the field. For more information, contact: Photomask...

EIPBN '03. (Shows & Conferences / Spie).(Electron, Ion, and Photon Beam Technology & Nanofabrication show)(Brief Article)
February 1, 2003... May 27-30 * Tampa, Florida The 47th Annual Electron, Ion, and Photon Beam Technology & Nanofabrication show will address lithographic science and micro- and nanofabrication. The scope of the conference will include topics like...

ASML step-and-scan system. (News & Products).(TWINSCAN AT:1200B step-and-scan system)(Brief Article)
February 1, 2003... The TWINSCAN AT:1200B step-and-scan system is a high numerical aperture (NA) 193nm system designed to extend ArF imaging technology for volume production of devices with features as small as 80nm. The third-generation ArF system is based on the...

Simulation software. (News & Products).(SIGMA-C GmbH's SOLID-EUV)(Brief Article)
February 1, 2003... SIGMA-C GmbH has introduced a new software product that simulates EUV lithography. SOLID-EUV facilitates R&D of EUV imaging technologies by allowing users to characterize specifications for masks, mask substrates and lens quality It simulates...

Throughput--the other lithography dimension. (Editorial).(microlithography)(Editorial)(Industry Overview)
February 1, 2003... Progress in microlithography has been measured in three spatial dimensions: resolution, overlay, and defocus, but, as in relativity, there is a fourth time-like dimension -- throughput. For most of history and most of the industry, larger...