Microlithography World articles from August 2004

Microlithography World archives from August 2004

Modeling of immersion lithography for OPC: liquid immersion optics create challenges for the optical lithography models used inside OPC software. Advanced models show the improvement in DOF expected for NA<1 and can cope with the subtleties of polarization and other effects expected for NA>1.(Feature)(depth-of-focus)(optical proximity correction)
August 1, 2004... Immersion lithography is rapidly advancing from the "curiosity" stage of a couple years ago to the reality of a commercially available technology that promises to extend the limits of optical lithography, yet again, for another 3-5 years....

The lithography expert: the impact of phase errors on phase-shifting masks, part 3.(Feature)(Column)
August 1, 2004... In previous editions of this column (Nov. 2002 and Feb. 2003), we examined the impact of phase errors on the printing of alternating phase-shifting masks (PSMs). While alternating-aperture PSMs are important, the overwhelming majority of...

The flight of the scanner slit.(Feature)
August 1, 2004... Process window degradation is thought to result from focus excursions introduced by lens aberrations and random variations across the wafer. But are these across-wafer variations truly random? Analysis of defocus maps reveals systematic image...

Stylus nanoprofilometry for mask metrology: a stylus nanoprofilometer designed specifically for advanced photomask metrology can characterize the 3D structures of advanced reticles with subnanometer precision.(Feature)(related article: Extracting profile and linewidth data from raw scan data )
August 1, 2004... IC manufacturers can extend the capability of their lithography steppers by adopting alternating-aperture phase-shift photomasks (AAPSM) and attenuated phase-shift (molybdenum silicide) in place of binary masks (chromium-on-glass or COG)....

Freescale, Arch collaborate on photoresists.(News & Products)(Brief Article)
August 1, 2004... Motorola subsidiary Freescale Semiconductor and Arch Microelectronic Materials have been collaborating on deep ultraviolet bilayer photoresists for multilayer use in Freescale's CMOS technology, according to Reuters. Scientists from both...

Ultratech introduces AP tools.(News & Products)(Brief Article)
August 1, 2004... Ultratech Inc. has developed a family of lithography systems to meet the advanced packaging (AP) lithography requirements for leading-edge 200mm and 300mm applications. The AP200 and AP300 systems are designed for gold- and solder-bump,...

SEMATECH focuses on immersion goals.(News & Products)(Brief Article)
August 1, 2004... International SEMATECH has announced the establishment of the 193nm immersion technology center (iTC), which will be a key program at the Advanced Materials Research Center (AMRC) in Austin, TX. SEMATECH technologists will work with customers...

EV Group debuts aligner technology.(News & Products)(Brief Article)
August 1, 2004... EV Group has developed an aligner technology that provides high-accuracy and high-resolution alignment, with active run-out control and sub-100nm dynamic alignment resolution. The NanoAlign technology is available on all of the company's mask...

TEL's newest Lithius products on order.(News & Products)(Brief Article)
August 1, 2004... Tokyo Electron Ltd. has begun accepting orders for its Clean Track Lithius i, a next-generation resist coater and developer for immersion lithography, and will begin taking orders for the Clean Track Lithius e, a model with enhancements for...

Extraction unveils litho tool filter system.(News & Products)(Brief Article)
August 1, 2004... Extraction has introduced a new filter system designed for 193nm step-and-scan lithography tools, encompassing conventional and immersion systems--the ex2600. With a smaller footprint than the E3000 system to accommodate the demand of tighter...

AE offers remote plasma source.(News & Products)(Brief Article)
August 1, 2004... Advanced Energy Industries Inc. (AE) has unveiled its Litmas RPS 1501 linear inductive remote plasma source for thin-film processes, including wafer pre-clean, photoresist strip, gate-dielectric deposition, and atomic-layer deposition...

Steppers step up in 2003.(News & Products)(Brief Article)
August 1, 2004... According to a report from VLSI Research, stepper suppliers saw a 14% increase in sales, with $3.9 billion in revenues in 2003. ASML finished strong as no. 1 in stepper revenues; from another perspective, however, Nikon outsold the Dutch...

Cadence and ASML sign up for RET.(News & Products)(Brief Article)
August 1, 2004... The two companies plan to develop an integrated design-for-manufacturability (DFM) flow, with Cadence licensing and co-developing two ASML MaskTools software packages: MaskWeaver, a full-chip RET and optical proximity correction (OPC) mask and...

SEMICON Taiwan.(Shows & Conferences)
August 1, 2004... September 13-15 * Taipei, Taiwan SEMI combines an integrated exposition with industry-specific programs that focus on the Taiwan equipment market For more information, contact: Irene Yu, SEMI Southeast Asia, ph 886/3-573-3399, e-mail...

24th Annual BACUS Symposium on photomask technology.(Shows & Conferences)
August 1, 2004... September 13-17 * Monterey, CA Photomask technology topics range from wafer fab issues with masks to reticle magnification. The list of exhibitors can be found online at www.spie.org/conferences. For more information, contact: SPIE, ph...

41st Interface Symposium.(Shows & Conferences)
August 1, 2004... September 26-28 Tempe, AZ Topics at the Interface Symposium will include immersion, multilayer, and i-line lithography; yield-improvement techniques; and NGL. For more information, contact: John L. di Frisco, e-mail...

International Microprocesses and Nanotechnology Conference.(Shows & Conferences)
August 1, 2004... October 26-29 * Osaka, Japan The Japan Society of Applied Physics is sponsoring this strategic forum on lithographic science and process technology. For more information, contact: ph 81/3-5814-5800, e-mail mnc@bcasj.or.jp,...

3rd Intl. EUVL Symposium.(Shows & Conferences)
August 1, 2004... November 2-4 Myazaki, Japan The Symposium on Extreme Ultraviolet Lithography is organized by EUVA and ASET in cooperation with SEMATECH and EUV CSC. Presentations are solicited under various topics. For more information, contact:...

Resolution enhancement and other technology babble.(Editorial)
August 1, 2004... In Genesis, it says that the "children of men" needed to be restrained from "accomplishing whatever they imagined to do," and this was accomplished by making it impossible for them to understand one another's languages. The confusion and...