Microlithography World articles from August 2003

Microlithography World archives from August 2003

Shows & conferences.
August 1, 2003... BACUS '03 * September 9-12 * Monterey, CA The 23rd Annual BACUS Symposium on Photomask Technology will focus on emerging and ongoing issues in the photomask industry. For more information, contact: SPIE, PO Box 10, Bellingham, WA...

Making 50nm contact holes with DUV.(Feature)
August 1, 2003... A combination of the most practical DUV resolution extension, post-development resist processing and binary mask techniques may be used to produce contacts for the 45nm node. Contact size will continue to shrink aggressively for future...

Designing ASICs with contacts on a grid.
August 1, 2003... Although placing contacts on a grid adds restrictions during circuit layout, the overall circuit area can be made smaller. Such a grid enables more effective use of resolution enhancement technologies, which then shrinks the grid dimensions....

Off-axis illumination.(The Lithography Expert)
August 1, 2003... Off-axis illumination (OAI) is one of the three major resolution enhancement technologies that have enabled optical lithography to push practical resolution limits far beyond what was once thought possible (the others being phase-shifting masks...

Immersion and polarization.(Editorial)
August 1, 2003... Photoresists are remarkable materials, performing many unheralded functions in semiconductor manufacturing. For example, the top of the resist film on a wafer is an optical element. It is the last place where the rays forming an image are bent...