Microlithography World articles from August 2002

Microlithography World archives from August 2002

The future of the CD-SEM: a possible agenda. (Feature).(Critical Dimension Scanning Electron Microscope)
August 1, 2002... The performance of the CD-SEM falls short of the specification set for the current device technology node by the ITRS Roadmap. However, in the short term, tool performance can be enhanced by the application of existing technologies. By making...

Large-area excimer laser lithography and photoablation systems. (Cover Article).
August 1, 2002... Many microelectronic, optoelectronic, and microsystem devices require large-area patterning with moderately high image resolution and precise alignment. A new class of projection lithography systems using excimer laser sources pattern...

Process settings and process latitude. (The Lithograhy Expert).
August 1, 2002... Over the last six editions of this column, we have explored the use of the normalized image log slope (NILS) and related metrics to describe the major impacts of image quality and process settings on critical dimension (CD) control. In the end,...

T-gate fabrication for GaAs processing. (Feature).
August 1, 2002... Lift-off resist processes are commonly used for fabricating critical device elements on III-V compound semi-conductors, including high-performance T-gates. High-resolution (sub-200nm) T-gate lift-off processes are feasible using both e-bearn...

Optical lithography: the future of mask manufacturing? (Feature).
August 1, 2002... Currently, mask fabrication technology is split between optical systems that provide great throughput but limited resolution and e-beam mask lithography that provides great resolution but limited throughput. Nevertheless, it is expected that...

Intel to invest in Nikon's litho program. (News & Products).
August 1, 2002... Nikon recently announced that the company is issuing a new group of securities in the form of convertible bonds. Intel Corp. has agreed to purchase a concurrent offering of these bonds in the amount of 10 billion yen (approximately US$80...

ASML's MEMS stepper. (News & Products).(microelectromechanical systems)(Product Announcement)
August 1, 2002... This family of 5x i-line reduction steppers is targeted to microelectromechanical systems (MEMS) and other applications such as compound semiconductors and ASICs. Through a dedicated options package, the new SA 5200 steppers--the SA 5200/45C...

Corning delivers highest-resolution lens. (News & Products).
August 1, 2002... Corning Tropel Corp., a wholly owned subsidiary of Corning Inc. and a leading manufacturer of high-precision ultraviolet optical systems, has manufactured a 157nm lithographic objective lens with record resolution. This 15x reduction...

IDT chooses ARGUS software. (News & Products).(Integrated Device Technology chooses New Vision Systems' advanced process control software)(Brief Article)
August 1, 2002... New Vision Systems (NVS) has announced that Integrated Device Technology Inc. (IDT) has selected NVS's ARGUS advanced process control (APC) software to control IDT's photolithography process. Deployment is under way at the company's facility in...

TEL works on coater/developer. (News & Products).(Tokyo Electron Limited's CLEAN TRACK ACT series)(Brief Article)
August 1, 2002... Tokyo Electron Limited (TEL) has announced the development of the next generation 300mm process coater/developer targeting the 300mm wafer market. The new system will combine technologies accumulated through TEL's resist coater/developers, the...

Canon's KrF and ArF scanners. (News & Products).(FPA-6000ES5 and FPA-6000AS4)(Brief Article)(Product Announcement)
August 1, 2002... Canon Inc. has announced two high-throughput photolithography scanners for the 110nm and 90nm nodes. Both scanners are built on the 300mm-ready FPA-6000 single-stage platform. The FPA-6000ES5, a KrF (248nm) scanner equipped with a 0.80-NA...

Sales milestone for Cymer's ELS-7000. (News & Products).
August 1, 2002... Cymer Inc., the supplier of excimer light sources used in semiconductor manufacturing, has achieved a major milestone by securing more than $40 million total in orders for its newest excimer light source, the ELS-7000. Developed in anticipation...

Overlay metrology software. (News & Products).(Brief Article)
August 1, 2002... KLA-Tencor Corp. today unveiled Archer Analyzer, a new software feature for the company's Archer 10 optical overlay metrology system that conducts fully automated, real-time, on-tool overlay metrology analysis. Seamlessly integrated with the...

Honeywell releases BARCs. (News & Products).(DUO bottom anti-reflective coatings)(Brief Article)
August 1, 2002... The Electronic Materials business of Honeywell has introduced DUO bottom anti-reflective coatings (BARCs). DUO products have been designed for use in chip manufacturing to improve and extend photolithographic processes. Currently in...

JMAR names litho technique. (News & Products).(Collimated Plasma Lithography)
August 1, 2002... JMAR Technologies Inc. has selected "Collimated Plasma Lithography" (or CPL) as the new name to describe more accurately the technology the company is currently developing to provide a more efficient, cost-effective method for processing the...

Shows & Conferences/SPIE.
August 1, 2002... MNE '02 September 16-19 * Lugano, Switzerland This international conference explores micro- and nanoengineering using lithography and related technologies. Topics include photon-based, electron beam, and ion beam lithography; soft...

"The Commanding Heights". (Editorial).(Editorial)
August 1, 2002... Over three weeks in April, PBS presented a six-hour TV series, "The Commanding Heights," by Daniel Yergin and Joseph Stanislaw, celebrating the triumph of deregulated capitalism over central planning. It was a remarkable series, delving into...