Microlithography World articles

Recent articles from Microlithography World

Development of a production EUV source.
November 1, 2008... Laser Produced Plasma (LPP) EUV source technology has advanced towards the specifications needed for actual chip production. The clear leader for high-power production EUV sources is laser-produced plasma (LPP) technology. After investigating alternatives, UP has been Cymer's chosen...

Manufacturable source mask optimization.
November 1, 2008... Diffractive optical elements improve imaging by optimizing the illumination for critical mask patterns without excessive loss of light. Among the innovations in lithography that enable pursuit of Moore's Law into the sub-wavelength realm is off-axis illumination (OAI), which shapes...

Proximity distance.(The Lithography Expert)
November 1, 2008... 0ptical proximity effects are a well-known problem in optical lithography--the printed size of a given feature is a function of other features in its proximity. This problem has an equally well-known solution--optical proximity correction (OPC), the modification of the mask layout to...

Murphy's Wall.(trends in project management)(Editorial)
November 1, 2008... Every technologist knows about Murphy's First Law: "Anything that can go wrong will go wrong." Most know about the Second Law: "If it could go wrong, but hasn't yet, it will at a more inconvenient time." But few appreciate how these laws control the dynamics of R&D. Before a project...

Technology diversity.(EDITORIAL)
August 1, 2008... Scientific competition among companies has produced numerous solutions to the common problems of the semiconductor industry. That diversity of technical approaches has been built into the very DNA of the industry, resulting in the flexibility needed to confront the unexpected. Other...